| Title |
Fabrication and Characterization of(Pb_{0.72}La_{0.28})Ti_{0.93}O_3 Thin Films by Pulsed Laser Deposition |
| Authors |
심경석(Shim, Kyung-Suk) ; 이상렬(Lee, Sang-Yeol) |
| Keywords |
laser ablation ; (Pb_{0.72}La_{0.28})Ti_{0.93}O_3 ; laser energy density ; deposition temperature ; surface morphology |
| Abstract |
Dielectric thin films of PLT(28) ((Pb_{0.72}La_{0.28})Ti_{0.93}O_3) have been deposited on Pt/Ti/SiO_2/Si substrates in situ by a laser ablation. We have systematically changed the laser fluence from 0.4 J/cm^2 to 3 J/cm^2, and deposition temperature from 450°C to 700°C. The surface morphology was changed from planar grain structure to columnar structure as the nucleation energy was increased. The PLT thin film with columnar structure showed good dielectric properties. The deposition temperature influenced on nucleation energy much stronger than the laser energy density did. |