| Title |
Temperature Dependence of the SrTiO_3 Capacitor Thin Films Deposited by RF Magnetron Sputtering |
| Authors |
오금곤(Oh, Gum-Kon) ; 이우선(Lee, Woo-Sun) ; 김남오(Kim, Nam-Oh) ; 김재민(Kim, Jai-Min) ; 이병성(Lee, Byung-Sung) ; 김상용(Kim, Sang-Yong) |
| Keywords |
RF-magnetron sputtering ; SrTiO_3films ; capacitance - voltage (C-V) |
| Abstract |
The SrTiO_3 thin films were prepared on Ag/TiN-coated and p-type bare Si(100) substrates by r.f. magnetron sputtering deposition technique. The electrical properties of the deposited films were investigated, which controlling deposition parameters such as substrate temperature and film thickness. The electrical properties ofthe SrTiO_3 films were measured using the capacitance-voltage(C-V) technique. The thickness dependence of the electrical properties of the SrTiO_3 films was analyzed of the connection with the films in series. The substrate affected the crystal structure and texture characteristics of the SrTiO_3 films. The resistivity of the film, sandwiched between Al and Ag films was measured, as a function of the temperature. |