| Title |
Structural and Electrical Properties of PZT(10/90)/PZT(90/10) Heterolayered Thin Films |
| Authors |
이성갑(Lee, Seong-Gap) ; 김경태(Kim, Gyeong-Tae) ; 배선기(Bae, Seon-Gi) ; 이영희(Lee, Yeong-Hui) |
| Keywords |
PZT Heterolayeted Film ; Nucleation Site ; Leakage Current Density ; Fatigue Properties |
| Abstract |
Ferroelectric PZT heterolayered thin films were fabricated by spin coating method on the Pt/Ti/SiO2/Si substrate using PZT(10/90) and PZT(90/10) m7etal alkoxide solutions. All PZT heterolayered films showed a homogeneous grain structures without presence of rosette structure. It can be assumed that the lower PZT layers played a role of nucleation site for the formation of the upper PZT layer. Pb-deficient PZT phase was formed at PZT/Pt interface due to the diffusion of Pb element into a Pt bottom electrode. The relative dielectric constant and the dielectric loss of the PZT-6 film were 567 and 3.6%, respectively. Increasing the number of coatings, remanent polarization and coercive field were decreased and the values of the PZT-6 heterolayered film were 7.18μC/cm^2 and 68.5kV/cm, respectively. Leakage current densities were increased with increasing the number of coatings, and the value of the PZT-4 film was about 7×10-8A/cm^2 at 0.05MV/cm. |