| Title |
Electrical Properties of (Sr_{0.85}Ca_{0.15})TiO_3 Thin Films with Top Electrodes |
| Authors |
조춘남(Jo, Chun-Nam) ; 김진사(Kim, Jin-Sa) ; 신철기(Sin, Cheol-Gi) ; 오재한(O, Jae-Han) ; 최운식(Choe, Un-Sik) ; 김충혁(Kim, Chung-Hyeok) ; 이준웅(Lee, Jun-Ung) |
| Keywords |
RF Sputtering method ; Thin Films ; Top electrodes ; Leakage Current ; Electrical Properties |
| Abstract |
(Sr_{0.85}Ca_{0.15})TiO_3(SCT) thin films were deposited on Pt-coated TiO_2/SiO_2/Si wafer by the rf sputtering method. Experiments were conducted to investigate the electrical properties of SCT thin films with various top electrodes. Various top electrodes as Pt, Al, Ag, Cu were deposited on SCT thin films by sputter and thermal evaporator. The characteristics of C-F and C-V of SCT thin films were not obviously varied with various top electrodes, SCT thin films annealed at 600°C represents as favorable capacitance characteristics than SCT thin films not annealed, and Pt top electrode have the most high capacitance. The characteristic of I-V of SCT thin films showed that Pt top electrode revealed more less leakage current density than other electrodes, had a leakage current density below 10-8[A/cm^2] until 25[V] applied voltage. |