| Title |
Design and Numerical Analyses of SOI Trench-MOS Bipolar-Mode Field Effect Transistor |
| Authors |
김두영(Kim, Du-Yeong) ; 오재근(O, Jae-Geun) ; 한민구(Han, Min-Gu) ; 최연익(Choe, Yeon-Ik) |
| Keywords |
trench-MOS ; BMFET ; current gain |
| Abstract |
A new Lateral Trench-MOS Bipolar-Mode Field-Effect Transistor(LTMBMFET) is proposed and verified by MEDICI simulation. By using a trench MOS structure, the proposed device can enhance the current gain without sacrificing other device characteristics such as the breakdown voltage. The channel region of the proposed device is formed between the trench MOS structure. So the effect of the substrate voltage is negligible when compared with the conventional device which has a channel region between the gate junction and the buried oxide layer. |