| Title |
NO_x Sensing Characteristic of TiO_2 Thin Film Deposited by R.F Magnetron Sputtering |
| Keywords |
TiO_2 ; NO_X ; Plasma-catalyst ; UV(ultraviolet) |
| Abstract |
In these days, diesel vehicle or power plant emits NO_X and SO_2 which cause air pollution like acid-rain, ozone layer destroy and optical smoke, therefore there are many kinds of methods considered for removing them such as SCR, catalyst, plasma process, and plasma-catalyst hybrid process. TTiO_2 is commonly used as catalyst to remove NO_X gas because it have very excellent chemical characteristic as photo catalyst. In this paper, NO_X sensing characteristic of TiO_2 thin film deposited by R.F Magnetron sputtering is investigated. A finger shaped electrode on Al_2O_3 substrate is designed and TiO_2 is deposited on the electrode by the magnetron sputtering deposition system. Chemical composition of the deposited TiO_2 thin film is TiO_{1.9} by RBS analysis. When the UV is irradiated on it with flowing air, capacitance of TiO_2 thin film increases, however, when NO gas is put into the system with air, it immediately decreases because of photo chemical reaction. and it monotonously decreases with increasing NO concentration. |