| Title |
A Electrical and Optical studies of WO3/Ag/WO3 Transparent Electrode by RF Magnetron Sputtering |
| Authors |
강동수(Kang, Dong-Soo) ; 이붕주(Lee, Boong-Joo) ; 권홍규(Kwon, Hong-Kyu) ; 신백균(Shin, Paik-Kyun) |
| DOI |
https://doi.org/10.5370/KIEE.2014.63.11.1533 |
| Keywords |
Multilayer ; WO_3 thin film ; Process gas flow ratio |
| Abstract |
WO_3/Ag/WO_3 multilayer was researched by using RF magnetron sputtering with transparent electrode. Process gas flow ratio with Ar/O_2 were selected the optimum conditions at 70sccm/2sccm and WO_3 thin film at its conditions was appeared at transmittance about 80% in the visible light region to the average. WO_3/Ag/WO_3 multilayer thin films were fabricated from the same process condition which was the same gas flow ratio of Ar and O_2 WO_3/Ag/WO_3 thin films were appeared transmittance about 93% and sheet resistance about 6.41{Ω}/{ square}. From the SEM images, each thin films were appeared when WO_3 is 40nm and O_2 is 10nm. |