| Title |
A study on Ar/CF4 Magnetized Inductively Coupled Plasma Using Fluid Simulation |
| Authors |
김윤기(Kim, Yun-Gi) ; 손의정(Son, Eui-Jeong) ; 위성석(Wi, Sung-Suk) ; 김동현(Kim, Dong-Hyun) ; 이호준(Lee, Ho-Jun) |
| DOI |
https://doi.org/10.5370/KIEE.2015.64.4.560 |
| Keywords |
Inductively Coupled Plasma ; Ar/CF_4 Plasma ; Fluid Simulation |
| Abstract |
The self-consistent simulation based on the drift-diffusion approximation with anisotropic transport coefficients was performed. The RHCP-wave propagation was observed in MICP and this wave was refracted toward the high-density region. The calculated impedance seen from the antenna terminal shows that resistance component of MICP is a higher than that of ordinary ICP. Because of a higher resistance, the power transfer efficiency was improved to 95%. This property is practically important for large-size, low-pressure plasma sources because high resistance corresponds to high power-transfer efficiency and stable impedance matching characteristics. |