| Title |
Analysis of structural and electrical properties according to gas ratio of CNW thin film grown on flexible substrate |
| Authors |
권석훈(Seok-hun Kwon) ; 황현석(Hyun-Suk Hwang) ; 강현일(Hyun-il Kang) |
| DOI |
https://doi.org/10.5370/KIEE.2021.70.12.1886 |
| Keywords |
Carbon nanowall; Vertical graphene; Low-temperature growth method; Polyimide film |
| Abstract |
Microwave plasma enhanced chemical vapor deposition (PECVD) can offer high purified carbon materials, such as graphene, carbon nanotube, and carbon nanowall. Among them, carbon nanowall is grown from nucleation on substrate at comparatively low temperature because it need not catalyst materials. Instead, ratio by contents of gas is very significant. Herein, we report change in structural and electrical properties of carbon nanowall through gas ratio that is varied contents of two reaction gas. In FE-SEM analysis, carbon nanowall showed two-typed morphology and the number of pores with pore’s scale was different with increase of hydrogen gas flow rate. In FE-SEM analysis, two geometric morphology of carbon nanowall were confirmed with pore's scale that was varied depending on gas ratio. Raman spectra consisting of D, G, and 2D bands showed that carbon nanowalls were pure carbon materials and composed with multi-layered vertical graphene sheets. In addition, carbon nanowalls were uniformly grown on polyimide film in each condition of gas ratio. Moreover, electrical characteristic was changed according to morphology and molecular structure of carbon nanowall via gas ratio. |