KIEE - The Transactions of the Korean Institute of Electrical Engineers

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The Transactions of the Korean Institute of Electrical Engineers

ISO Journal TitleTrans. Korean. Inst. Elect. Eng.

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T. Motomura, Y. Kasashima, F. Uesugi, H. Kurita, N.A Kimura, 2014, Real-time characteristic impedance monitoring for end-point and anomaly detection in the plasma etching process, Jpn. J. Appl. Phys., Vol. 53, No. 03DC03

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KIEEThe Transactions of
the Korean Institute of Electrical Engineers

The Transactions of the Korean Institute of Electrical Engineers

ISO Journal TitleTrans. Korean. Inst. Elect. Eng.

Journal Search

Journal XML

References

KIEEThe Transactions ofthe Korean Institute of Electrical Engineers

The Transactions of the Korean Institute of Electrical Engineers

ISO Journal TitleTrans. Korean. Inst. Elect. Eng.

Journal Search

Journal XML

References

KIEEThe Transactions of
the Korean Institute of Electrical Engineers